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ZnO nanowalls (NWLs) represent a nontoxic, abundant, and porous material, with promising applications in sensing and photocatalysis. They can be grown by low-cost solution methods on Al (covered) substrates; Al(OH)4– generated in situ is assumed to be responsible for engendering the NWL morphology. Here, we grew ZnO NWLs by chemical bath deposition (at 70–95 °C). The roles of pH, concentration of Al(OH)4–, and growth time on the thickness and quality of NWL film were experimentally investigated, and the growth kinetics was explained in terms of a self-screening model. Increasing the chemical bath pH from 5.7 to 7.4 led to a 40% thicker film and more NWLs per unit area of the substratedue to increased concentration of Al(OH)4–but these were accompanied by the presence of embedded micro-/nanoparticles. We propose the use of anodized Al as a way to enhance the growth rate and density of …
American Chemical Society
Publication date: 
14 Aug 2015

Kingsley O Iwu, Vincenzina Strano, Alessandro Di Mauro, Giuliana Impellizzeri, Salvo Mirabella

Biblio References: 
Volume: 15 Issue: 9 Pages: 4206-4212
Crystal Growth & Design