The electroless deposition of silver on Hydrogen terminated Silicon (100) substrates has been investigated with 2.0 MeV He+ ions Rutherford backscattering measurements and electron microscopy observations for 1 mM and 5 mM AgNO 3 solutions. The RBS analyzes provide the amount of deposited Ag atoms as a function of the immersion time (1 s-160 s), the particle size and density are given by electron microscopy. A nuclei density in excess of 10 11 cm− 2 was instantaneously generated. The amount of deposited Ag increases with the square root of the immersion time, following the Cottrell equation, for the 1 s-5 s interval. A diffusion coefficient of about 2× 10− 5 cm 2 s− 1 for the Ag ions in the solution fits the experimental data. At longer deposition times the Ag ions flux is constant and the diffusion is governed by a static boundary layer few hundred microns thick. With increasing deposition time the particles …